Laser conditioning of LaF₃/MgF₂ dielectric coatings at 248 nm

authored by

Eric Eva, Klaus Mann, Norbert Kaiser, B. Anton, Rainer Henking, Detlev Ristau, P. Weissbrodt, D. Mademann, L. Raupach, Erich Hacker

Abstract

Highly reflective LaF₃/MgF₂ systems for a wavelength of 248 nm on MgF₂ and crystalline quartz substrates were investigated. The influence of laser conditioning on damage threshold and absorptance was remarkable in those coatings that had a high initial absorptance. Monitoring with a laser calorimeter revealed the conditioning effect to be a function of the irradiation dose rather than of energy density or pulse rate. Furthermore, x-ray photoelectron spectroscopy and transmission electron microscopy investigations showed that conditioning induces stoichiometric and structural changes in the multilayers, especially in near-surface sublayers, whereas scanning electron microscopy and atomic force microscopy investigations indicated that the surface remains unchanged.

External Organisation(s)

Laser-Laboratorium Göttingen e.V.
Fraunhofer Institute for Applied Optics and Precision Engineering (IOF)
Laser Zentrum Hannover e.V. (LZH)
JENOPTIK Laser GmbH

Type

Article

Journal

Applied Optics

Volume

35

Pages

5613-5619

No. of pages

7

ISSN

1559-128X

Publication date

01.10.1996

Publication status

Published

Peer reviewed

Yes

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics, Engineering (miscellaneous), Electrical and Electronic Engineering

Electronic version(s)

https://doi.org/10.1364/AO.35.005613 (Access: Unknown)