Laser conditioning of LaF₃/MgF₂ dielectric coatings at 248 nm

verfasst von

Eric Eva, Klaus Mann, Norbert Kaiser, B. Anton, Rainer Henking, Detlev Ristau, P. Weissbrodt, D. Mademann, L. Raupach, Erich Hacker

Abstract

Highly reflective LaF₃/MgF₂ systems for a wavelength of 248 nm on MgF₂ and crystalline quartz substrates were investigated. The influence of laser conditioning on damage threshold and absorptance was remarkable in those coatings that had a high initial absorptance. Monitoring with a laser calorimeter revealed the conditioning effect to be a function of the irradiation dose rather than of energy density or pulse rate. Furthermore, x-ray photoelectron spectroscopy and transmission electron microscopy investigations showed that conditioning induces stoichiometric and structural changes in the multilayers, especially in near-surface sublayers, whereas scanning electron microscopy and atomic force microscopy investigations indicated that the surface remains unchanged.

Externe Organisation(en)

Laser-Laboratorium Göttingen e.V. (LLG)
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF
Laser Zentrum Hannover e.V. (LZH)
JENOPTIK Laser GmbH

Typ

Artikel

Journal

Applied Optics

Band

35

Seiten

5613-5619

Anzahl der Seiten

7

ISSN

1559-128X

Publikationsdatum

01.10.1996

Publikationsstatus

Veröffentlicht

Peer-reviewed

Ja

ASJC Scopus Sachgebiete

Atom- und Molekularphysik sowie Optik, Ingenieurwesen (sonstige), Elektrotechnik und Elektronik

Elektronische Version(en)

https://doi.org/10.1364/AO.35.005613 (Zugang: Unbekannt)